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基于真空热压扩散法的金刚石/Ti界面生成机制

袁建东 于爱兵 孙磊 王燕琳 迟剑英

袁建东, 于爱兵, 孙磊, 等. 基于真空热压扩散法的金刚石/Ti界面生成机制[J]. 复合材料学报, 2020, 37(12): 3168-3176. doi: 10.13801/j.cnki.fhclxb.20200519.001
引用本文: 袁建东, 于爱兵, 孙磊, 等. 基于真空热压扩散法的金刚石/Ti界面生成机制[J]. 复合材料学报, 2020, 37(12): 3168-3176. doi: 10.13801/j.cnki.fhclxb.20200519.001
YUAN Jiandong, YU Aibing, SUN Lei, et al. Formation mechanism of diamond/Ti interface based on vacuum hotpressing diffusion method[J]. Acta Materiae Compositae Sinica, 2020, 37(12): 3168-3176. doi: 10.13801/j.cnki.fhclxb.20200519.001
Citation: YUAN Jiandong, YU Aibing, SUN Lei, et al. Formation mechanism of diamond/Ti interface based on vacuum hotpressing diffusion method[J]. Acta Materiae Compositae Sinica, 2020, 37(12): 3168-3176. doi: 10.13801/j.cnki.fhclxb.20200519.001

基于真空热压扩散法的金刚石/Ti界面生成机制

doi: 10.13801/j.cnki.fhclxb.20200519.001
基金项目: 国家自然科学基金(51875294);宁波市自然科学基金(2018A610153);宁波市科技创新2025重大专项(2018B10006)
详细信息
    通讯作者:

    于爱兵,博士,教授,博士生导师,研究方向为切削加工技术及表面工程 E-mail:yuaibing@nbu.edu.cn

  • 中图分类号: TB3333

Formation mechanism of diamond/Ti interface based on vacuum hotpressing diffusion method

  • 摘要: 采用真空热压扩散法在聚晶金刚石表面制备Ti层,探究金刚石表面金属化过程中的界面生成机制。利用扫描电子显微镜和X射线衍射仪,分析了钛层的表面形貌、界面结构和界面间的物相组成,采用能谱仪对界面进行了元素分析,计算了聚晶金刚石与Ti层之间界面的扩散带宽度及生成TiC的化学反应吉布斯自由能变。研究结果表明:在聚晶金刚石表面形成了平整、致密的Ti层,在聚晶金刚石与Ti层界面之间存在C、Ti和Co元素的扩散,在结合界面处产生了一定宽度的元素扩散带,同时在金刚石表面生成了点状TiC。真空热压扩散法实现了金刚石与Ti层的化学结合,可以提高金刚石与Ti层的结合强度。

     

  • 图  1  真空热压扩散实验的试样装夹示意图

    Figure  1.  Schematic diagram of specimen clamping for vacuum hot pressing diffusion method

    图  2  Ti层表面的SEM图像

    Figure  2.  SEM image of Ti coating layer

    图  3  PCD/Ti界面的SEM图像

    Figure  3.  SEM images of PCD/Ti interface

    图  4  PCD与Ti层的界面EDS结果

    Figure  4.  EDS analysis of interface between PCD and Ti layer

    图  5  PCD与Ti层的界面EDS能谱分析

    Figure  5.  EDS spectra analysis of interface between PCD and Ti layer

    图  6  C在Ti中的扩散系数D与温度T的关系

    Figure  6.  Relationship between C diffusion coefficient D and temperature T in Ti

    图  7  镀Ti与未镀Ti的PCD表面形貌对比

    Figure  7.  Comparison of PCD surface morphologies with coating of Ti and without coating

    图  8  不同区域的PCD表面XRD图谱

    Figure  8.  XRD patterns of PCD surface on different regions

    图  9  图7中表面形貌的局部放大

    Figure  9.  Local magnification images of surface morphologies in Fig. 7

    图  10  PCD与Ti箔的真空热压扩散过程示意图

    Figure  10.  Schematic diagrams of vacuum hot pressing diffusion processes between PCD and Ti film

    表  1  钛箔和PCD的化学成分

    Table  1.   Chemical composition of TA1 and PCD

    MaterialC/wt%Fe/wt%Ti/wt%Co/wt%W/wt%Si/wt%N/wt%H/wt%
    TA1 0.01 0.05 99.87 0.05 0.015 0.005
    PCD 88.12 8.99 2.89
    Notes: TA1—Pure titanium grade TA1;PCD—Polycrystalline diamond.
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出版历程
  • 收稿日期:  2020-01-21
  • 录用日期:  2020-05-14
  • 网络出版日期:  2020-05-19
  • 刊出日期:  2020-12-15

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