激光辅助共晶驱动导热Al/AlN复合材料基板的制备及其键合机制

Laser assisted eutectic-driven fabrication of thermally conductive Al/AlN composites substrate and joining mechanism

  • 摘要: 直接键合铝(DBA)基板已广泛应用于大功率电子器件中。然而,熔融铝易氧化的特性一直是其长期可靠性方面的一个问题。在此提出一种新型DBA制备工艺,采用激光活化辅助化学镀铜技术来制备金属过渡层,通过Al-Cu共晶法,在610℃至650℃的烧结温度下,实现纯铝与氮化铝陶瓷基板的键合。揭示了Al/AlN的结合机理及界面处CuAl2相对接头断裂行为的影响。基于界面扩散的理论分析,对Al/Cu界面处共晶相的形成与生长进行调控,并提高了结合强度,实现Al/AlN基板平均剪切强度达55.1 MPa。该共晶工艺不仅能避免液态铝带来的氧化问题,还能在接头处形成牢固的结合,从而为开发高性能DBA基板提供了新的策略。

     

    Abstract: Direct bonded aluminium (DBA) substrates have been widely implemented in high-power electronic devices. However, the oxidation-prone nature of molten aluminum has been a long-term reliability issue. Herein, we have proposed a novel DBA fabrication process utilising laser-assisted electrochemical copper plating to prepare a metallic transition layer. Through the Al-Cu eutectic method, bonding between pure aluminium and aluminium nitride ceramic substrates has been achieved at sintering temperatures ranging from 610 to 650 ℃. The bonding mechanism of Al/AlN was elucidated, along with the influence of the CuAl2 phase at the interface on joint fracture behaviour. Based on theoretical analysis of interfacial diffusion, the formation and growth of the eutectic phase at the Al/Cu interface were controlled, thereby enhancing the bonding strength and achieving an average shear strength of 55.1 MPa for the Al/AlN substrate. This eutectic process not only avoids the oxidation issues associated with liquid aluminium, but also forms a robust bond at the joint, thereby providing a new strategy for the development of high-performance DBA substrates.

     

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