硅烷偶联剂与SiO2表面化学反应的研究

A STUDY OF SURFACIAL REACTION BETWEEN SILANES AND FUMED SiO2

  • 摘要: 本文用气相色谱和傅里叶红外光谱直接检测了作为玻璃纤维模型的气象沉积SiO2与硅烷偶联剂-CCl4体系所进行的反应.证明了这两相间的界面上存在着化学反应,存在着以化学键相联接的界面层结构.从实验结果推断出,硅烷偶联剂本身经均缩聚反应后,生成-Si-O-Si-键的红外吸收峰在1056~1063cm-1,而硅烷偶联剂与气相沉积SiO2上硅羟基发生共缩聚反应后生成的-Si-O-Si-键红外吸收峰在1105~1120cm-1.

     

    Abstract: The chemical reaction occured between the surfaces of silica,as a model of glass and silanes-H2O system (or silanes-CCl4 system),has begin directly detected by chromatography and Fourier Transform Infrared Spectra.This strongly proves the existence of chemical reaction on the interface between these two phases,that is to say,the interfacial structure bonded by chemical bonds.From experimental results results it can be infeaed that the -Si-O-Si bond,IR absorbing peak 1056-1063 cm-1,appears by the by the homo-polycondensation reaction of silane itself.Then,the -Si-O-Si bond,IR absorbing peak 1105-1120 cm-1,appears by the coolycon densation reaction detween silane and the fumed SiO2.

     

/

返回文章
返回