液相渗Si工艺制备2D CF/SiC复合材料中SiC晶粒的生长机制

Grain growth mechanism of SiC in 2D CF/SiC composites prepared by liquid Si infiltration

  • 摘要: 由液相渗硅工艺(LSI)制得了2D CF/SiC 复合材料,经过XRD分析得知材料中SiC均为β相。经过同质量比的K3Fe(CN)6与KOH混合水溶液对其进行腐蚀,由SEM观察腐蚀后2D CF/SiC 复合材料的形貌,发现其中SiC呈现细等轴晶和粗大晶粒两种不同的形貌。分析认为LSI工艺制备2D CF/SiC 复合材料中生成的SiC有两种生成机制:Si原子通过空位机制向碳中扩散形成无定型SiC,在保温过程中结晶形成细晶SiC层;C原子扩散进入熔融态硅中形成C—Si基团,由于温度梯度和浓度梯度的存在,在远离C/SiC界面处过饱和析出,通过溶解-沉淀机制形成粗大的SiC晶体,在晶粒的长大过程中伴随着层错的出现。

     

    Abstract: 2D CF/SiC composites were prepared by liquid silicon infiltration. XRD analysis revealed that SiC only presents as β phase in composites. The mixed solution of K3Fe(CN)6 and KOH in the same mass ratio was used to corrosive the material. SEM images show that coarse and fine two morphological of the grains exist in 2D CF/SiC composites. It's conclude that distinguishing shapes of SiC are produced by two different growth theory: silicon atoms diffuse into carbon through the vacancy mechanism which leads to the appearance of amorphous SiC. As heat-retaining time increasing, amorphous SiC gradually transforms into the crystalline state. After the carbon atoms diffuse through the silicon carbide layer, carbon atoms dissolve in the liquid silicon and exist in the form of C—Si group. Under the influence of temperature gradient and concentration gradient, Si—C group move farther away from the C/SiC interface and begin to nucleate after reach saturation.Coarse silicon carbide crystals are formed by the dissolution-precipitation mechanism, which accompany the emergence of stacking fault.

     

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