金属镍调控金刚石-石墨复合薄膜电子结构及场发射性能研究

Research on the electronic structure and field emission performance of metal nickel-regulated diamond-graphite composite film

  • 摘要: 近年来,金刚石-石墨复合薄膜因具有高纵横比和高导电性的同时还具有较高的机械硬度和化学惰性,成为场发射阴极材料的研究热点。本文突破传统场发射阴极材料微观结构调控性能的局限,以金属镍调控复合薄膜电子结构,采用微波等离子化学气相沉积(MPCVD)法,在生长过程中同步引入金属镍源,制备了含金属镍的金刚石-石墨复合薄膜,引入金属镍后复合薄膜场发射性能开启场降低至1.7 V/μm,在4 V/μm电场下的电流密度达到9.23 mA/cm2。研究表明在金刚石-石墨复合薄膜中引入金属镍可调控其电子结构,即降低表面功函数并强化电子在薄膜内输运,从而显著降低场发射开启场强并提升发射电流密度,本论文研究为获得开启场强低和发射电流密度高的新型场发射阴极材料提供了新思路。

     

    Abstract: In recent years, diamond-graphite composite film has become a research hotspot for field emission cathode materials due to its high vertical ratio and high electrical conductivity, as well as high mechanical hardness and chemical inertness. This paper breaks through the limitations of the microstructural regulation performance of traditional field emission cathode materials, regulates the electronic structure of composite films with metal nickel, adopts microwave plasma chemical vapor deposition (MPCVD) method, introduces metal nickel sources synchronously during the growth process, and prepares a nickel-containing diamond-graphite composite film, which does not contain metal nickel composite film, after the introduction of metallic nickel, the field emission performance of the composite film is reduced to 1.7 V/μm, and the current density under the 4 V/μm electric field reaches 9.23 mA/cm2. Research shows that the introduction of metal nickel into a diamond-graphite composite film can regulate its electronic structure, that is, reduce the surface function and strengthen the transport of electrons in the film, so as to significantly reduce the field emission opening field strength and improve the emission current density. This paper studies to obtain a new field emission with low opening field strength and high emission current density. The cathode material provides new ideas.

     

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